Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information
Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information

Ion Beam Etching & Sputtering
Z-Flex System

4Wave’s Z-Flex tool is a versatile platform with the capability of performing Ion Beam Etching (IBE, RIE, CAIBE) and Ion Beam Deposition (IBD) or Biased Target Deposition (IBS) in a common vacuum environment. It is fully computer controlled featuring a single wafer transfer system. The Z-Flex platform can also be incorporated in the 4Wave Cluster Tool. It has a large application base in markets including MEMS, Thin film optics, Semiconductor and Data Storage.

Markets Include:
  • Data Storage
  • Thin Film Magnetics
  • Semiconductor
  • Reactive Ion Assisted Etching
  • Etching and overcoat processing
Applications
  • Disk Slider fabrication
  • TMR and GMR applications
  • Semiconductor Failure Analysis
  • FINFET and advanced memory development

Specifications
  • 4 Sputter targets
  • Ion Beam Etching capability
  • Single wafer load lock system or wafer handoff via robot interface
  • High volume pumping system
  • Several options in ion beam source size and output
  • ESD compliant
  • Modular design
  • Maintenance friendly with impressive MTTR/MTBF
  • Ion Beam Etch (IBE): Dry Etching;  Reactive Ion Etching ( RIE) ; CAIBE capability
  • Ion Beam Sputtering:  Metal and oxide Encapsulation
  • Biased Target Sputtering ™High rate Metal sputtering; Reactive sputtering;  Low defect high-performance thin films
Please contact us for more information