Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information
Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information

Ion Beam Sputtering Cluster Tool

4Wave’s cluster tool is the premier Sputtering system. The platform incorporates the most advanced engineering for performance and uptime. It is fully computer controlled featuring advanced wafer scheduling and LOT management. The 4Wave cluster tool addresses the highest performance in markets including MEMS, Thin Film Optics, Semiconductor and Data Storage.

Markets Include:
  • Semi-Conductor
  • MEMS
  • Data Storage
  • Optics
  • Wafer processing services
Applications
  • Thermal Imagining
  • EUV Mask
  • Magnetic Tunnel Junctions
  • Interference coating Rugate filters
  • High-K Materials
  • Optoelectronic Materials
  • Superconducting Materials
  • Uncooled IR sensors
  • Spin Valves/AMR/GMR/TMR

Specifications
  • 6” and 8” wafer processing
  • Multiple processing modules on a robot and cassette front end
  • Can accommodate up to three (3) processing modules
  • Advanced wafer management system
  • Excellent MTTR / MTBF performance
  • Reactive and non-reactive sputtering and etching
  • Advanced process control
  • Highest performance thin film technology
  • Ion Beam Etch (IBE): Dry Etching;  Reactive Ion Etching ( RIE) ; CAIBE capability
  • Ion Beam Sputtering:  Metal and oxide Encapsulation
  • Biased Target Sputtering ™High rate Metal sputtering; Reactive sputtering;  Low defect high-performance thin films
Please contact us for more information