Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information
Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information

Planetary Etch System ( PSIBE )

The 4Wave Planetary Etch System expands the 4Wave LL Etch system to include 3 processing stages for high throughput.

Markets Include
  • Semi-Conductor
  • Data Storage
  • MEMS
  • Wafer processing services
Applications
  • Patterned Etch

Specifications
  • 22cm – 36cm gridded Kaufman ion source
  • < 3% non-uniformity over 150 mm.
  • Water cooled, tilting, rotating
  • Up to 150mm diameter process surface
  • SIMS endpoint detection
  • 3 Wafer Planets
  • Technology (modules)
  • Ion Beam Etch (IBE): Dry Etching; Reactive Ion Etching (RIE); CAIBE capability;  Endpoint detector optional
Please contact us for more information