Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information
Inverted Metallurgical Microscope
ECLIPSE MA200
Inverted Metallurgical Microscope
ECLIPSE MA100N
More Information
More Information
Assuring you our best, always

Load Lock Etch System

The 4Wave Load Lock Etch System is a flagship product addressing several significant markets. This system boasts high-performance etching, critical thin film profile milling, glancing angle milling, etc. 4Wave Single Wafer Load Lock Etching Systems addresses the needs of customers seeking a flexible, cost-effective, small-footprint, ion-etching/ion processing workhorse for general purpose research and production applications.

Markets Include
  • Semi-Conductor
  • Data Storage
  • MEMS
  • Wafer processing services
Applications
  • Delayering (Failure Analysis)
  • Patterned Etch

Specifications
  • 12cm & 22cm Gridded RF Ion Sources
  • 3 x 8″ target carousel
  • 300mm diameter process surface Deposition Uniformity < 3%
  • Repeatability <1%
  • Substrate plasma pre-cleaning
  • Single Platten Load Locked Stage
  • Multi substrate fixturing
  • > 500 hrs MTBF
Please contact us for more information