ICP-OES Spectrometer – SPECTRO ARCOS

SPECTRO ARCOS ICP-OES: Only MultiView plasma instrument in the market ‒ true axial AND true radial plasma observation in a single instrument

  • ORCA Optical System: Simultaneous spectrum capture in the 130-770 nm wavelength range with up to 5x more sensitivity than Echelle based systems – delivers best in class performance in the UV/VUV range
  • LDMOS Generator: Up to 2000 W power and robust enough to handle volatile organics and high dissolved solids with ease

Description

SPECTRO ARCOS is totally not the same as customary ICP-OES. The left half of the instrument is furnished with a high-level optical framework that gives phenomenal exactness, goal and solidness. Furthermore, the instrument can be outfitted with interfaces for outspread or pivotal plasma perception.

The PaschenRunge mounted CCD optical framework gives a superb goal of 8.5 picometers in the frequency scope of 130 to 340. Different components of the SPECTRO ARCOS incorporate an imaginative self-invigorated generator outfitted with an artistic cylinder and strong state power source, a minimal expense, low-support UVPlus framework that can accomplish high straightforwardness from VUV to 130, and a transient estimation recurrence of roughly 10 Hz And 8 decimal unique reach quick readout framework.

The activity of the SPECTRO ARCOS is consequently observed by the ICAL framework rationale to guarantee constant working conditions. “Savvy Analyzer Vision” graphical UI is described by clear design, high adaptability, and basic activity. Regardless of whether it is making estimation strategies or quantitatively reprocessing put away spectra, basic and simple to utilize capacities make it simple for administrators.

With its absolutely synchronal performance, the system will complete one analysis in as little as thirty seconds. That makes it the quickest in its category. From the simplest sample to the foremost challenging, SPECTRO ARCOS delivers higher analyses at high speed. Result: the user analyses more samples in less time.

The system is intended to supply the quickest and most correct mensuration of any sample generally
encountered in industrial or analysis analysis. MultiView offers users the flexibility to decide on axial or radial plasma observation per their desired application profile.

Applications

  • Wastewater
  • Sewage sludge
  • Soil
  • Dust
  • Filter
  • Additives in oil
  • Wear metals in oil

Key Features

  • Low operating cost
  • Reliable service life
  • No-purge UV-PLUS sealed gas purification technology
  • No external cooling OPI-AIR interface
  • Simplified sample introduction
  • Superior optical performance; High accuracy, resolution and stability
  • Rugged free-running generator with ceramic tube and solid-state power supply

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