Plasma System – Quadrio α High Volume Plasma System

  • With maximum uniformity, superior gas and RF distribution, a proprietary controlling software and compliance to CE and SEMI international standards, our plasma cleaning and etching systems are ideal for all applications where process reliability and repeatability are a must.

Description

Quadrio α is a compact standalone plasma cleaning system suitable for substrates with a strip form factor.

Capable of performing PE and RIE processes, the Quadrioα provides high uniformity reliable results with a competitive throughput.
 

Product Features:

Quadrio α comes in two versions:

  • Quadrioα 4 with 4 tracks, 400 UPH*
  • Quadrioα 5 with 5 tracks, 500 UPH*

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